水冷分子束外延系统

水冷分子束外延系统 MBE-01

产品详情 咨询金童

                    
EW-100

 纯水冷设计,无需使用液氮冷却

 可选装自动烘干装置

 可支持自动成膜软件

 The MBE system is a device developed  by our entirely new concept. It does not  use liquid nitrogen for cooling.

 And automatic baking mechanism and automatic film formation software are available.

EW-3 EW-10 EW-500

Features(产品特点)

1.MBE system without using liquid nitrogen.

 There is no shroud assembly for liquid nitrogen. 10e-8 Pa or more can be easily  achieved even though liquid nitrogen is not used.

 The system includes a chamber with source flanges for effusion cells as standard
equipment. The combination of different size of source flange is available for use with EB gun sputter gun as an option. Consequently EB gun and sputter gun are usable and the system has a much broader range of applications.

 In case water leakage accidentally occurs, the system adopts watertight construction in the pumping system.

2.High film quality control and excellent operation performances.

 Operations of pumping, cell temperature, shutter etc, are automatically contrlled. Each operation can be performed on a LCD screen.

 RHEED pattern, spectum by radical beam source, spectrum by mass spectrometer etc. can be observed and controlled on the LCD operation screen.

 Preheating mechanism and radical beam source can be mounted onto the loading
lock chamber.

Temperature distribution
of manipulator
LCD operation screen
for vacuum control